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| ESML5116 | Thin Film Technologies | 3+0+0 | ECTS:7.5 | | Year / Semester | Fall Semester | | Level of Course | Second Cycle | | Status | Elective | | Department | DEPARTMENT of ENERGY SYSTEMS ENGINEERING | | Prerequisites and co-requisites | None | | Mode of Delivery | | | Contact Hours | 14 weeks - 3 hours of lectures per week | | Lecturer | Prof. Dr. İsmail POLAT | | Co-Lecturer | | | Language of instruction | Turkish | | Professional practise ( internship ) | None | | | | The aim of the course: | | Learning, searching and presenting the fundamentals on thin film technologies and engineering applications. |
| Programme Outcomes | CTPO | TOA | | Upon successful completion of the course, the students will be able to : | | | | PO - 1 : | To learn the fundamentals of vacuum technologies and gas kinetics | 1,2,3 | 5, | | PO - 2 : | To learn the fundamentals of thin film fabrication techniques | 1,2,3 | 5, | | PO - 3 : | To learn and be able to use thin film evaporation and deposition techniques | 1,2,3 | 5, | | PO - 4 : | To learn the engineering applications of thin films | 1,2,3 | 5, | | CTPO : Contribution to programme outcomes, TOA :Type of assessment (1: written exam, 2: Oral exam, 3: Homework assignment, 4: Laboratory exercise/exam, 5: Seminar / presentation, 6: Term paper), PO : Learning Outcome | | |
| Fundamentals of thin film physics; preparation of thin films: evaporation, sputtering, ion plating, CVD, electrochemical deposition; nucleation and growth of thin films, evaporation rate measurements, film thickness measurements; chemical analysis of thin films; mechanical electrical and optical properties; engineering applications |
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| Course Syllabus | | Week | Subject | Related Notes / Files | | Week 1 | Introduction to thin films | | | Week 2 | Introduction to vacuum technologies, Gas kinetics and related mathematical models | | | Week 3 | Introduction to techniques on thin film growth, determination of research subjects | | | Week 4 | Preparation of thin films, Physical vapor deposition | | | Week 5 | Thermal and e-beam evaporation | | | Week 6 | Sputter tehniques | | | Week 7 | Chemical vapor deposition | | | Week 8 | Electrochemical deposition | | | Week 9 | Midterm Exam | | | Week 10 | Pulsed laser deposition | | | Week 11 | The growth of thin films, and film thickness measurements | | | Week 12 | chemical properties of thin films | | | Week 13 | Engineering applications of thin films | | | Week 14 | Presentation of Term Projects | | | Week 15 | Presentation of Term Projects | | | Week 16 | Final Exam | | | |
| 1 | Donald Smith, 2007, Thin-Film Deposition: Principles and Practice, Prentice Hall | | | |
| Method of Assessment | | Type of assessment | Week No | Date | Duration (hours) | Weight (%) | | Mid-term exam | 9 | 21.11.2024 | 1 | 30 | | Presentation | 12 | 30.12.2024 | 1 | 20 | | End-of-term exam | 16 | 13.01.2025 | 1 | 50 | | |
| Student Work Load and its Distribution | | Type of work | Duration (hours pw) | No of weeks / Number of activity | Hours in total per term | | Yüz yüze eğitim | 3 | 13 | 39 | | Sınıf dışı çalışma | 4 | 14 | 56 | | Arasınav için hazırlık | 15 | 2 | 30 | | Arasınav | 14 | 1 | 14 | | Ödev | 4 | 7 | 28 | | Dönem sonu sınavı için hazırlık | 10 | 2 | 20 | | Dönem sonu sınavı | 3 | 1 | 3 | | Total work load | | | 190 |
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